Prof. Dr. rer. nat. Lothar Frey
| Name: | Prof. Dr. rer. nat. Lothar Frey
|
| Postal address: | Lehrstuhl für Elektronische Bauelemente
Cauerstr. 6
91058 Erlangen |
| Room: | 1.122 |
| Phone number: | 09131/85-28633 |
| Fax number: | 09131/85-28698 |
| E-mail: | lothar.frey@leb.eei.uni-erlangen.de |
| Office hours: | weekly on tuesday 9:00 - 10:00
1.122
Bitte bei Sekretariat (1.121) anmelden.
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Courses / Lectures
Supervised theses
2013
2012
2011
2010
2009
2002
1999
1997
1996
1995
1994
1993
- Diffusionsverhalten von Übergangsmetallen auf Siliciumoberflächen im Niedertemperaturbereich
- Herstellung retrograder Wannen zur Latch-up-Unterdrückung
- Herstellung und Charakterisierung von implantierten vergrabenen Rekombinationsschichten
1992
Publications
2013
2012
2011
2010
2009
2008
2007
2006
2005
2004
2003
2002
2001
2000
- »"Monte Carlo Simulation and Modeling of Ion Implantation Induced Contamination Profiles«, XIIIth International Conference on Ion Implantation Technology (IIT 2000), Alpbach, - (2000)
- »Aspects of Barium Contamination in High Dielectric Dynamic Random Access Memories«, J. Electrochem. Soc 147, 4297 (2000)
- »Contamination Control for Ion Implantation«, IIT School, Edgewater, 564-601 (2000)
- »Contamination Control for Ion Implantation«, XIIIth International Conference on Ion Implantation Technology (IIT 2000), Alpbach, Österreich (2000)
- »Defects and Gallium-Contamination During Focused Ion Beam Micro Machining«, XIIIth International Conference on Ion Implantation Technology (IIT 2000), Alpbach, Österreich (2000)
- »Electrical Reliability Aspects of Through the Gate Implanted MOS-Structures with Thin Oxides«, 11th Workshop on Dielectrics in Microelectronics (WoDiM), München (2000)
- »Enhanced Depth-Resolution Analysis with Medium Energy Ion scattering (MEIS) for Shallow Junction Profiling«, XIIIth International Conference on Ion Implantation Technology (IIT 2000), Alpbach, Österreich (2000)
- »Field emitter array fabricated using focused ion and electron beam induced reaction«, Journal of Vacuum Science and Technology B 2, 976-979 (2000)
- »Gate Oxide Damage Due to Through the Gate Implantation in MOS-Structures with Ultrathin and Standard Oxides«, XIIIth International Conference on Ion Implantation Technology (IIT 2000), Alpbach, 103-106 (2000)
- »Investigation of Molybdenum Contamination in 11B+ and 31P+ Implants«, XIIIth International Conference on Ion Implantation Technology (IIT 2000), Alpbach, Österreich (2000)
- »Monte Carlo Simulation and Modeling of Ion Implantation Induced Contamination Profiles«, Ion Implantation Technology 2000, Alpbach (2000)
- »Safety Considerations for Ion Implanters«, IIT School, Edgewater (2000)
- »Safety Considerations for Ion Implanters«, XIIIth International Conference on Ion Implantation Technology (IIT 2000), Alpbach, Österreich (2000)
- »Wafer Conserving Full Range Construction Analysis for IC Fabrication and Process Development based on FIB / Dual Beam Inline Application«, International Symposium for Testing and Failure Analysis (ISTFA 2000), Seattle, USA (2000)
1999
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