Prof. Dr.-Ing. Heiner Ryssel
| Name: | Prof. Dr.-Ing. Heiner Ryssel
ehem. Lehrstuhlinhaber (im Ruhestand) |
| Postanschrift: | Lehrstuhl für Elektronische Bauelemente
Cauerstr. 6
91058 Erlangen |
| Telefonnummer: | 09131/761-109 |
| Fax: | 09131/85-28698 |
| E-Mail: | heiner.ryssel@leb.eei.uni-erlangen.de |
Lehrveranstaltungen
Wissenschaftliche Schwerpunkte
- CMOS-Technologie
- Halbleiterfertigungsgeräte
- Ionenimplantation
- elektronische Bauelemente
- Sensorik
Betreute Arbeiten
2012
2011
2010
2009
2008
2007
2006
2005
2004
2003
2002
2001
1999
1998
1997
1996
1995
1994
- Entwicklung und Realisierung eines hochauflösenden Kamerasystems, das zur Bidlaufnahme bei Specleinterferometrischen Messungen sowie in weiteren wissenschaftlichen Meßaufbauten eingesetzt werden soll
1993
1991
1990
1988
1987
Publikationen
2013
2012
2011
2010
2009
2008
2007
2006
2005
2004
2003
2002
- »Cell Adhesion on Modified Polyethylene«, Journal of Materials Science 37 (6), 1183 (2002)
- »Characterisation of BaxSr1 xTiO3 Films Using Spectroscopic Ellipsometry, Rutherfo¬rd Backscattering Spectrometry and X Ray Diffraction«, Journal of Non Crystalline Solids 303 (1), 179-184 (2002)
- »Determination of Aluminum Diffusion Parameters in Silicon«, Journal of Applied Physics, accepted for publication (2002)
- »Development of Enhanced Depth-resolution Technique for Shallow Dopant Profiles«, Nuclear Instruments and Methods in Physics Research 1-4, 26 (2002)
- »Effect of Barium Contamination on Gate Oxide Integrity in High-k DRAM«, Journal of Non-Crystalline Solids 303, 12 (2002)
- »HandMon ISPM: Handling Monitoring in a Loading Station of a Furnace«, 13th Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop 2002, Boston, Massachusetts, 113 (2002)
- »Influence of Photoresist Pattern on Charging Damage During High Current Ion Implantation«, 7th Int. Symp. On Plasma & Process Induced Damage, Maui, Hawaii, USA, 106-109 (2002)
- »MOCVD of titanium dioxid on the basis of new precursors«, Journal of non-crystalline solids 303, 64-68 (2002)
- »Phi Scatterometry for Integrated Linewidth and Process Control in DRAM Manufacturing«, IEEE Transactions on Semiconductor Manufacturing 15 (4), 470 (2002)
- »Platinum Contamination Issues in Ferroelectric Memories«, J. Appl. Phys. 92, 3257 (2002)
- »Recombination Lifetimes of Iron-contaminated Silicon Wafers: Characterization through a Single Set of Capture Cross sections«, Solid State Phenomena 82-84, 373 (2002)
- »Simulation of the Influence of Via Sidewall Tapering on Step Coverage of Sputter deposited Barrier Layers«, Microelectronic Engineering 64 (1-4), 321-328 (2002)
2001
2000
1999
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UnivIS