Prof. Dr.-Ing. Heiner Ryssel
| Name: | Prof. Dr.-Ing. Heiner Ryssel
ehem. Lehrstuhlinhaber (im Ruhestand) |
| Postanschrift: | Lehrstuhl für Elektronische Bauelemente
Cauerstr. 6
91058 Erlangen |
| Telefonnummer: | 09131/761-109 |
| Fax: | 09131/85-28698 |
| E-Mail: | heiner.ryssel@leb.eei.uni-erlangen.de |
Lehrveranstaltungen
Wissenschaftliche Schwerpunkte
- CMOS-Technologie
- Halbleiterfertigungsgeräte
- Ionenimplantation
- elektronische Bauelemente
- Sensorik
Betreute Arbeiten
2012
2011
2010
2009
2008
2007
2006
2005
2004
2003
2002
2001
1999
1998
1997
1996
- Untersuchungen über die Injektionsabhängigkeit der Minoritätsträger-Rekombinationslebensdauer in Silicium mit Hilfe des ELYMAT-Verfahrens
1995
1994
1993
1991
1990
1988
1987
Publikationen
2013
2012
2011
2010
2009
2008
2007
2006
2005
2004
- »1985 - 2004 Technologie für die Mikroelektronik«, IIS20 Jahre Förderkreis für die Mikroelektronik, Erlangen-Tennenlohe (2004)
- »3D-Feature-Scale Simulation of Sputter Etching with Coupling of Equipment Simulation«, Proceedings of SISPAD (Simulation of Semiconductor Processes and Devices) 125, - (2004)
- »3D-Feature-Scale Simulation of Sputter Etching with Coupling to Equipment Simulation«, Poster Presentation at SISPAD 2004, München (2004)
- »3D-Simulation of Ionized Metal Plasma Vapor Depostition«, Microelectronic Engineering 76, 100-105 (2004)
- »Additional Peaks in Mass Spectra Due to Charge Exchange Events and Dissociation of Molecular Ions During Extraction«, Poster Presentation on IIT 2004, Taipei, Taiwan (2004)
- »Annealing of Aluminium Implanted 4H-SiC: Comparison of Furnace and Lamp Annealing«, Material Science Forum 621, 438-485 (2004)
- »Design, Fabrication, and Characterization of a Microactuator for Nebulazation of Fluids«, Proceedings of Sensors and Microsystems, Italian Conference 2003, Italy World Scientific, 388 (2004)
- »E-Learning for Microelectronics Manufacturing«, Proceedings of the 13th ISSM 2004, - (2004)
- »Electrical Characterization and Reliability Aspects of Zirconium Silicate Films Obtained from Novel MOCVD Precursors«, Microelectronic Engineering 72, 315-320 (2004)
- »Ellipsometrie zur Prozessüberwachung in der Halbleiterfertigung«, Institut für Plasmaforschung3rd Workshop Ellipsometrie, Stuttgart (2004)
- »Integration of Field Emitters into Scanning Probe Microscopy Sensors Using Focused Ion and Electron Beams«, Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 22, 1402 (2004)
- »Investigation of Rapid Thermal Annealed pn-Junctions in SiC«, Material Science Forum, 457-460 (2004)
- »Investigations into the Wear of a WL10 Ion Source«, Poster Presentation on IIT 2004, Taipeh, Taiwan (2004)
- »Ion Sputtering at Grazing Incidence for SIMS-Analysis«, 7th International Conference on Computer Simulation of Radiation Effects in Solids (COSIRES), Abstracts and Programme, 114 (2004)
- »Ion Sputtering at Grazing Incidence for SIMS-Analysis«, 7th International Conference on Computer Simulation of Radiation Effects in Solids (COSIRES), Helsinki, Finnland (2004)
- »Measurement Data Evaluation for in Situ Single-wavelength Ellipsometry During Reactive Ion Etching«, 5th European Advanced Equipment Control/Advanced Process Control (AEC/APC) Conference, Dresden 2004, - (2004)
- »Mikroelektronik - Schlüsseltechnologie unserer Zeit«, IISBErlanger Techniktage, Erlangen (2004)
- »Modeling of Chemical-Mechanical Polishing on Patterned Wafers as Part of Integrated Topography Process Simulation«, MAM2004, Leuven, Belgium 76, 89-94 (2004),
http://www.sciencedirect.com/science?ob=MImg&imagekey=B6V0W-4D1V29P-2-C&cdi=5657&user=746735&orig=browse&coverDate=10%2F01%2F2004&sk=999239998&view=c&wchp=dGLbVlb-zSkzk&md5=4039dffb5d8e4b57dba393cf896acaef&ie=/sdarticle.pdf
- »Modelling of Chemical-Mechanical Polishing on Patterned Wafers as Part of Integrated Topography Process Simulation«, Microelectronic Engineering 76, 1-4 (2004)
- »Modelling of Chemical-Mechanical Polishing on Patterned Wafers as Part of Integrated Topography Process Simulation«, Poster Presentation at MAM 2004 (2004)
- »Modelling of the Influence of Schottky Barrier Inhomogenities on SiC Diode Characteristics«, Material Science Forum 973, 457-460 (2004)
- »Optical Characterization of Ferroelectric Strontium-Bismut-Tantalate (SBT) Thin Films«, Thin Solid Films, Special Issue: the 3rd International Conference on Spectroscopic Ellipsometry 455-456, 495-499 (2004)
- »Three-Dimensional Simulation of Ionized Metal Plazma Vapor Deposition«, Poster Presentation at MAM 2004 ( Materials for Advanced Metallization ), Brüssel, Belgien (2004)
- »Vorstellung des neuen Bayerischen Forschungsverbundes für Nanoelektronik (FORNEL)«, Bayerisches Staatsministerium für Wissenschaft, Forschung und KunstJahrestagung und Mitgliederversammlung von abayfor ( Arbeitsgemeinschaft der Bayerischen Forschungsverbünde ), München (2004)
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