Prof. Dr. rer. nat. Lothar Frey
| Name: | Prof. Dr. rer. nat. Lothar Frey
|
| Postanschrift: | Lehrstuhl für Elektronische Bauelemente
Cauerstr. 6
91058 Erlangen |
| Zimmer: | 1.122 |
| Telefonnummer: | 09131/85-28633 |
| Fax: | 09131/85-28698 |
| E-Mail: | lothar.frey@leb.eei.uni-erlangen.de |
| Sprechstunde: | wöchentlich dienstags 9:00 - 10:00
1.122
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Lehrveranstaltungen
Betreute Arbeiten
2013
2012
2011
2010
2009
2002
1999
1997
1996
- Erstellung und Test eines Patterngenerators für die Mikrobearbeitung mittels FIB
1995
1994
1993
1992
Publikationen
2013
- »Alloying of ohmic contacts to n-type 4H-SiC via laser irradiation«, Materials Science Forum 740-742, 773-776 (2013)
- »Bimodal CAFM TDDB distributions in polycrystalline HfO2 gate stacks: The role of the interfacial layer and grain boundaries«, Microelectronic Engineering 109, 129-132 (2013)
- »Characterization of diverse gate oxides on 4H-SiC 3D trench-MOS structures«, Materials Science Forum 740-742, 691-694 (2013)
- »Comparative study of n-LIGBT and n-LDMOS structures on 4H-SiC«, Materials Science Forum 740-742, 887-890 (2013)
- »Conceptional design of nano-particulate ITO inks for inkjet printing of electron devices«, Journal of Materials Science 48, 1623-1631 (2013)
- »Electrical impact of the aluminum p-implant annealing on lateral MOSFET transistors on 4H-SiC n-epi«, Materials Science Forum 2013, 521-524 (2013)
- »Functional epoxy polymer for direct nano-imprinting of micro-optical elements«, Microelectronic Engineering, Article in Press (2013)
- »Influence of parasitic capacitances on conductive AFM I-V measurements and approaches for its reduction«, Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 31, art. no. 01A108 (2013)
- »Laser alloying nickel on 4H-silicon carbide substrate to generate ohmic contacts«, Journal of Laser Micro Nanoengineering 8, 97-101 (2013)
- »Optimization of copper top-side metallization for high performance SiC-devices«, Materials Science Forum 740-742, 801-804 (2013)
- »Processing of silicon nanostructures by Ga+ resistless lithography and reactive ion etching«, Microelectronic Engineering, Article in Press (2013)
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