Prof. Dr.-Ing. Heiner Ryssel
| Name: | Prof. Dr.-Ing. Heiner Ryssel
ehem. Lehrstuhlinhaber (im Ruhestand) |
| Postanschrift: | Lehrstuhl für Elektronische Bauelemente
Cauerstr. 6
91058 Erlangen |
| Telefonnummer: | 09131/761-109 |
| Fax: | 09131/85-28698 |
| E-Mail: | heiner.ryssel@leb.eei.uni-erlangen.de |
Lehrveranstaltungen
Wissenschaftliche Schwerpunkte
- CMOS-Technologie
- Halbleiterfertigungsgeräte
- Ionenimplantation
- elektronische Bauelemente
- Sensorik
Betreute Arbeiten
2012
2011
2010
2009
2008
2007
2006
2005
2004
2003
2002
2001
- Modellierung der Ladungsträgerrekombination in bordotiertem Silicium bei Eisenkontamination
1999
1998
1997
1996
1995
1994
1993
1991
1990
1988
1987
Publikationen
2013
2012
2011
2010
2009
2008
- »23 Jahre Fraunhofer Institut für Integrierte Systeme und Bauelementetechnologie (IISB) und Lehrstuhl für Elektronische Bauelemente (LEB)«, Fraunhofer IISBAbschiedsveranstaltung Professor Ryssel, Erlangen (2008)
- »Advanced Annealing Strategies for the 32 nm Node«, International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Hakone, Japan (2008)
- »Advanced Annealing Strategies for the 32 nm Node«, International Conference on Simulation of Semiconductor Processes and Devices, Hakone, Japan (2008)
- »Alternative Source/Drain Contact-Pad Architectures for Contact Resistance Improvement in Decananao Scales DMOS Devices«, Poster Presentation, 9th International Conference on ULtimate Integration on Silicon (ULIS), Udine, Italien (2008)
- »Alternative Source/Drain Contact-pad Architectures for Contact Resistance Improvement in Decanano-scaled DMOS Devices«, Proceedings "9th International Conference on Ultimate Integration on Silicon" (ULIS) 2008, 179 (2008)
- »An Application-driven Improvement of the Drift-Diffusion Model for Carrier Transport in Decanano-scaled CMOS Devices«, IEEE Transactions on Electron Devices 55, 3227 (2008)
- »Angular Distributions of Sputtered Atoms from Semiconductor Targets at Grazing Ion Beam Incidence Angles«, 17th International Conference on Ion Implantation Technology, Monterey (California), 236 (2008)
- »Application driven Simulation of Nanoscaled CMOS Transistors and Circuits«, Journal of Computational and Theoretical Nanoscience 5, 1170 (2008)
- »Barrier Inhomogeneities of Tungsten Schottky Diodes on 4H-SiC«, Semiconductor Science and Technology 23, 045005 (2008)
- »Characterization of Ru and RuO2 Thin Films Prepared by Pulsed Metal Organic Chemical Vapor Deposition«, Physica Status Solidi (c) 5, 1231 (2008)
- »Custom-specific UV Nanoimprint Templates and Life-time of Antisticking Layers«, Microelectronic Engineering 85, 897 (2008)
- »DC-Arc Behavior of a Novel Active Fuse«, ESSDERC 2008, Edinburgh, 67-70 (2008)
- »Detailed arsenic concentration profiles at Si/SiO2 interfaces«, J. Appl. Phys. 104, 043507 (2008)
- »Detailed arsenic concentration profiles at Si/SiO2 interfaces«, Virtual Journal of Nanoscale Science & Technology 18(9), - (2008)
- »Detailed Carrier Lifetime Analysis of Iron-Contaminated Boron-doped Silicon by Comparison of Simulation and Measurement«, Journal of the Electrochemical Society 155, H117 (2008)
- »Dispersing and stabilizing semiconducting nanoparticles (Posterpräsentation)«, 2nd International Workshop on Semiconducting Nanoparticles, Duisburg (2008)
- »Distribution and segregation of arsenic at the SiO2 /Si interface«, J. Appl. Phys. 104, 023518 (2008)
- »Electrical AFM Techniques for the Advanced Characterization of Materials in Semiconductor Technology«, Seeing at the NanoScale VI, Berlin (2008)
- »Electrical and Topographical Characterization of Aluminium Implanted Layers in 4H Silicon Carbide«, Physica Status Solid (b) 245, 1315 (2008)
- »Experimental Observation of FIB Induced Lateral Damage on Silicon Samples«, 34th International Conference on Micro- and Nano-Engineering (MNE) 2008, Athen, Griechenland (2008)
- »Fabrication and Characterization of Nanoparticulate ZnO-TFTs (Posterpräsentation)«, Summer School Nanotronics, Marl (2008)
- »HfSiO/SiO2- and SiO2/HfSiO/SiO2-Gate Stacks for non-volatile memories«, Thin Solid Films 516, 7727-7731 (2008)
- »High yield aerosol synthesis of monodisperse, high-purity silicon nanoparti-cles«, European Aerosol Conference (EAC), Thessaloniki (2008)
- »High Yield Aerosol Synthesis of Monodisperse, High-purity Silicon Nanoparticles«, European Aerosol Conference (EAC), Thessaloniki, Greece (2008)
- »Highly Filled Polymers for Power Passives Packaging«, 2nd Electronics Systemintegration Technology Conference, Greenwich, 403-410 (2008)
- »Highly Filled Polymers for Power Passives Packaging«, 2nd Electronics System-Integration Technology Conference (ESTC), London, United Kingdom (2008)
- »Hightech-Materialien und Hybridantriebe - Forschung für die Elektronik von morgen«, Präsidialprojekt II -Abschlußveranstaltung des Fraunhofer Innovationsforums, Stuttgart (2008)
- »Impact of Physical and Chemical Treatment on Si Nanoparticulate Systems (Posterpräsentation)«, Advanced Processing of Novel Functional Materials (APNFM), Dresden (2008)
- »Influence of the Oxidation Temperature and Atmosphere on the Reliability of Thick Gate Oxides on the 4H-SiC C(000-1) face«, Materials Science Forum 600, 597 (2008)
- »Ink and Surface Modification for Printing of Nanoparticulate Functional Structures«, Japan Society for the Promotion of Science, Core-to-core Program Meeting: Advaced Particle Handling Science, Erlangen (2008)
- »Ion Implantation Into Nanoparticulate Functional Layers«, 17th International Conference on Ion Implantation Technology 2008, Monterey (California), 537-540 (2008)
- »Ion Implantation into Nanoparticulate Functional Layers«, Fraunhofer IISB39. Treffen der Nutzergruppe Ionenimplantation, Erlangen (2008)
- »Ion Implantation Into Nanoparticulate Functional Layers (Posterpräsentation)«, 17th International Conference on Ion Implantation Technology, Monterey (CA) (2008)
- »Low pressure gas phase synthesis of monodisperse, high-purity Si building blocks«, 2nd International Workshop on Semiconducting Nanoparticles (Posterpräsentation), Duisburg (2008)
- »Moore's Law: Wie geht es mit Bauelementen und Materialien für die Nanoelektronik weiter«, Kolloquium EAM Säule B, Erlangen (2008)
- »On the Stability of Fully Depleted SOI MOSFETs Under Lithography Process Variations«, 38th Solid-State Device Reasearch Conference, Edinburgh, Schottland, 194-197 (2008)
- »Performance Optimization of Semiconductor Manufacturing Equipment by the Application of Discrete Event Simulation«, Proceedings "28th Computers and Information in Engineering Conference (CIE) 2008", - (2008)
- »Polymer bonded soft magnetic particles for planar inductive devices«, CIPS 2008, Nürnberg (2008)
- »Pre-Silicon SPICE Modeling on Nano-Scaled SOI MOSFETs«, Proceedings "9th International Conference on ULtimate Integration on Silicon" (ULIS) 2008, 215 (2008)
- »Pre-Silicon SPICE Modeling on Nano-Scaled SOI MOSFETs (Poster)«, 9th International Conference on Ultimate Integration on Silicon (ULIS), Udine, Italien (2008)
- »Properties of TaN Thin Films Produced Using PVD Linear Dynamic Deposition Technique«, Proceedings "14th International Conference on Solid Films and Surfaces", - (2008)
- »Recent Improvements in the Integration of field Emitters into Scanning Probe Microscopy Sensors«, Microelectronic Engineering 85, 5-6 (2008)
- »Segregation of Antimony to Si/SiO2 Interfaces«, Materials Science and Engineering B 154-155, 264-267 (2008)
- »Segretation onf Antimony to Si/SiO2 Interfaces«, 2008 EMRS Spring Meeting, Straßburg, Frankreich (2008)
- »Self-Aligned Growth of Organometallic Layers for Nonvolatile Memories: Comparison of Liquid-Phase and Vapor-Phase Deposition«, J. Electrochem. Soc. 155, H693-H697 (2008)
- »Simulation of Mass Interferences Considering Charge Exchange Events and Dissociation of Molecular Ions During Extraction«, 17th International Conference on Ion Implantation Technology 2008, Monterey (California), 159-162 (2008)
- »SSRM Characterisation of FIB Induced Damage in Silicon«, Microelectronic Engineering 85, 1135 (2008)
- »Suppression of Parasitic Electron Injection in SONOS type Memory Cells Using High k Capping Layers«, Poster Presentation at the Workshop on Dielectrics in Microelectronics (WODIM), Bad Saarow (2008)
- »Suppression of parasitic electron injection in SONOS-type memory cells using high-k capping layers«, Workshop on Dielectrics in Microelectronics, Bad Saarow, 145-146 (2008)
- »Threshold Voltage Engineering by Lanthanide Doping of the MOS Gate Stack«, 17th International Conference on Ion Implantation Technology, Monterey (California), 501-504 (2008)
- »Tunneling atomic-force microscopy as a highly sensitive mapping tool for the characterization of film morphology in thin high-k dielectrics«, Applied Physics Letters 92, 252910 (2008)
- »UV Nanoimprint Lithography Process Optimization for Electron Device Manufacturing on Nanosized Scale«, 34th International Conference on Micro- and Nano-Engineering (MNE) 2008, Athen, Griechenland (2008)
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