Clean Room Laboratory
The big hall of the clean room laboratory at the Chair of Electron Devices
The Chair of Electron Devices maintains a clean room building with a laboratory area of 600 m2 (class 10) and 400 m2 (class 1000). The modern equipment offers excellent prerequisites for demanding research tasks in the field of micro- and nanoelectronics.
Together with the Fraunhofer IISB comprehensive process technology is conducted, allowing for CMOS-compatible process steps for the fabrication of test structures and devices in 150 mm silicon technology. Single process steps are available for wafer diameters up to 300 mm. Moreover, the LEB pioneers in the fabrication of semiconductor devices on silicon carbide substrates.
Within the areas of research Semiconductor- and Nanotechnology, Semiconductor Fabrication Tools and Methods as well as Technology and Device Simulation research tasks are conducted, that complement one another in respect to development, optimization and realization of process steps in microelectronic fabrication. The IISB extends this research spectrum with the research areas Crystal Growth and Power Electronic Systems.
Extensive international cooperation with other research institutes and the industry exist on all areas of research.